01.Process/Chamber
Ring Heaters
Its structure incorporates a heating element cast into a high thermal conductivity aluminum alloy, providing a stable and uniform heating effect, making it suitable for vacuum or hermetically sealed process modules that require annular heating.
Product Applications and Specifications
Product Application
- Semiconductor manufacturing equipment (such as cavity heating modules for CVD, ALD, Etch, etc.).
- Heating rings for chamber or pipes in a vacuum environment.
- The annular peripheral heating source of the heating uniform temperature platform.
- Heating modules for medical, laboratory, and food processing equipment.
| Max. Operating Temperatures |
Voltage | Power Range | Integrated Sensor/ Controller (optional) |
Material |
|---|---|---|---|---|
| 300°C | 110V ~ 230V | Custom (Configurable upon request) |
Type K TC | Aluminum Alloy |
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